Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products

Type:
Journal
Info:
Journal of Alloys and Compounds, Volume 758, 2018, Pages 116-121
Date:
2018-05-07

Author Information

Name Institution
Junhua YouShenyang University of Technology
Yaozu GuoShenyang University of Technology

Films


Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Magnetic Properties
Analysis: VSM, Vibrating Sample Magnetometer

Substrates

τ-MnAl

Notes

1721