Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products

Type:
Journal
Info:
Journal of Alloys and Compounds, Volume 758, 2018, Pages 116-121
Date:
2018-05-07
DOI:
https://doi.org/10.1016/j.jallcom.2018.05.075

Author Information

Name Institution
Junhua YouShenyang University of Technology
Yaozu GuoShenyang University of Technology

Films

Plasma Co

Hardware used: Quros Plus 150
Dicobalt Hexacarbonyl Tert-ButylAcetylene (CCTBA)
CAS#: 56792-69-9
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H2, Hydrogen
CAS#: 1333-74-0

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Deposition Temperature = 150C

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Diagnostic: JEOL JSM-7000F

Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope
Diagnostic: FEI Technai F20

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Park Systems, NX10

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Kratos Analytical Axis Ultra DLD

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Bruker D8 Discover

Characteristic: Magnetic Properties
Analysis: VSM, Vibrating Sample Magnetometer
Diagnostic: Quantum Design PPMS

Substrates

τ-MnAl

Notes

1721