Plasma enhanced atomic layer deposition of Co thin film on τ-MnAl for effective magnetic exchange coupling and enhanced energy products
Type:
Journal
Info:
Journal of Alloys and Compounds, Volume 758, 2018, Pages 116-121
Date:
2018-05-07
Author Information
Name | Institution |
---|---|
Junhua You | Shenyang University of Technology |
Yaozu Guo | Shenyang University of Technology |
Films
Plasma Co
Film/Plasma Properties
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Magnetic Properties
Analysis: VSM, Vibrating Sample Magnetometer
Substrates
τ-MnAl |
Notes
1721 |