Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
Type:
Journal
Info:
Journal of The Electrochemical Society, 158 (1) D42-D47 (2011)
Date:
2010-10-18
Author Information
| Name | Institution |
|---|---|
| Windu Sari | Yeungnam University |
| Tae-Kwang Eom | Yeungnam University |
| Soo-Hyun Kim | Yeungnam University |
| Hoon Kim | Applied Materials |
Films
Thermal Ru
Plasma Ru
Thermal Ru
Plasma Ru
Film/Plasma Properties
Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Substrates
| TiN |
| SiO2 |
Notes
| 1360 |