Publication Information

Title:
Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma
Type:
Journal
Info:
Journal of The Electrochemical Society, 158 (1) D42-D47 (2011)
Date:
2010-10-18

Author Information

Name Institution
Windu SariYeungnam University
Tae-Kwang EomYeungnam University
Soo-Hyun KimYeungnam University
Hoon KimApplied Materials

Films

Thermal Ru


Plasma Ru


Thermal Ru


Plasma Ru


Film/Plasma Properties

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Compositional Depth Profiling
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Substrates

TiN
SiO2

Keywords

Notes

1360