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Surface Infrared Spectroscopy during Low Temperature Growth of Supported Pt Nanoparticles by Atomic Layer Deposition

Type:
Journal
Info:
J. Phys. Chem. C, 0, 0 (ja), pp null
Date:
2015-12-12
DOI:
http://dx.doi.org/10.1021/acs.jpcc.5b10839

Author Information

Name Institution
Roger H.E.C. BoschEindhoven University of Technology
Frank L. BloksmaPhilips
Jochem M.M. HuijsPhilips
Marcel A. VerheijenEindhoven University of Technology
Erwin (W.M.M.) KesselsEindhoven University of Technology

Films

Plasma Pt

Hardware used: Custom
(Trimethyl)methylcyclopentadienylplatinum, MeCpMe3Pt
CAS#: 94442-22-5
O2, Oxygen
CAS#: 7782-44-7
H2, Hydrogen
CAS#: 1333-74-0
Deposition Temperature = 25C

Film/Plasma Properties

Characteristic: Surface Reactions
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Diagnostic: Bruker Optics Vector 22

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000U

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL JEM ARM 200

Substrates

Si(100)

Notes

436