Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Al(OEt)3, Al(OC2H5)3, Aluminum Ethoxide, Aluminum Triethoxide, Triethoxyaluminum, Aluminium Triethanolate, CAS# 555-75-9

Informational Websites

NumberWebsite
1https://en.wikipedia.org/wiki/Aluminium_triethoxide

Where to buy

NumberVendorRegionLink
1Sigma-Aldrich, Co. LLC🇺🇸Aluminum ethoxide 97%
2Alfa Aesar🇺🇸Aluminum ethoxide
3Pegasus Chemicals🇬🇧Aluminium ethoxide
4TCI🇺🇸Aluminum Ethoxide
5Gelest🇺🇸Aluminum Ethoxide
6Ereztech🇺🇸Aluminum ethoxide
7Strem Chemicals, Inc.🇺🇸Aluminum ethoxide, 99%
8American Elements🇺🇸Aluminum Ethoxide

www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.

If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.


Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1Radical Enhanced Atomic Layer Deposition of Metals and Oxides