The publication database currently has 1609 entries.
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202 Films Compositions
272 Precursors and Plasma Gases
76 Deposition Hardwares
249 Film and Plasma Characteristics
85 Theses
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Growth of Gallium Nitride Films on Multilayer Graphene Template Using Plasma-Enhanced Atomic Layer Deposition
Ni80Fe20 nanotubes with optimized spintronic functionalities prepared by atomic layer deposition
On the Contact Optimization of ALD-Based MoS2 FETs: Correlation of Processing Conditions and Interface Chemistry with Device Electrical Performance
Search 1609 plasma ALD publications by:
Search 1609 plasma ALD publications by:
Al(OEt)3, Al(OC2H5)3, Aluminum Ethoxide, Aluminum Triethoxide, Triethoxyaluminum, Aluminium Triethanolate, CAS# 555-75-9
Informational Websites
| Number | Website |
|---|---|
| 1 | https://en.wikipedia.org/wiki/Aluminium_triethoxide |
Where to buy
| Number | Vendor | Link |
|---|---|---|
| 1 | Ereztech | Aluminum ethoxide |
Plasma Enhanced Atomic Layer Deposition Film Publications
Your search for publications using this chemistry returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
| Number | Title |
|---|---|
| 1 | Radical Enhanced Atomic Layer Deposition of Metals and Oxides |