|2||Strem Chemicals, Inc.||Copper(II) acetylacetonate, 98+%|
www.plasma-ald.com does not endorse any chemical suppliers. These links are provided for the benefit of our users. If a link goes bad, let us know.
If you would like your company's precursor products listed, or your existing listing changed or removed, send me an email.
Your search for publications using this chemistry returned 6 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.
|1||Effects of Hydrogen Plasma Treatments on the Atomic Layer Deposition of Copper|
|2||Hydrogen plasma-enhanced atomic layer deposition of copper thin films|
|3||Integration of Atomic Layer Deposition-Grown Copper Seed Layers for Cu Electroplating Applications|
|4||Integration of Electrochemically Deposited Cu with Plasma Enhanced Atomic Layer Deposition-Grown Cu Seed Layers|
|5||Radical-Enhanced Atomic Layer Deposition of Metallic Copper Thin Films - Thesis Coverage|
|6||Radical Enhanced Atomic Layer Deposition of Metals and Oxides|
© 2014-2019 plasma-ald.com