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Introducing Plasma ALD, LLC's first in-house product. |
An economical, compact inductively coupled plasma source. |
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Ideal for: |
- Plasma-Enhanced Atomic Layer Deposition
- Thin Film Etch
- Surface cleaning
- Surface modification
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Contact us for more information. |
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Where to buy Cu(TMHD)2, Cu(THD)2, bis(2,2,6,6-tetramethyl-3,5-heptanedionate) copper, Copper(II) dipivaloylmethanate CAS# 14040-05-2
Cu(TMHD)2, Cu(THD)2, bis(2,2,6,6-tetramethyl-3,5-heptanedionate) copper, Copper(II) dipivaloylmethanate CAS# 14040-05-2 is available from the following source(s):
| Number | Vendor | Region | Link |
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| 1 | Pegasus Chemicals | 🇬🇧 | Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper |
| 2 | Ereztech | 🇺🇸 | 2,2,6,6-Tetramethyl-3,5-heptanedionate(II) copper |
| 3 | Strem Chemicals, Inc. | 🇺🇸 | Bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II), 99% [Cu(TMHD)2] |
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