Plasma enhanced atomic layer deposition of a (nitrogen doped) Ti phosphate coating for improved energy storage in Li-ion batteries

Type:
Journal
Info:
Journal of Power Sources 497 (2021) 229866
Date:
2021-03-27
DOI:
https://doi.org/10.1016/j.jpowsour.2021.229866

Author Information

Name Institution
Lowie HenderickGhent University
Ahmed HamedHasselt University
Felix MattelaerGhent University
Matthias M. MinjauwGhent University
Mikko NisulaGhent University
Johan MeersschautIMEC
Jolien DendoovenGhent University
Mohammadhosein SafariHasselt University
Philippe M VereeckenIMEC
Christophe DetavernierGhent University

Films

Plasma TiP2O7

Hardware used: Custom Remote Inductively Coupled Plasma
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
Trimethyl phosphate, TMP, (MeO)3PO
CAS#: 512-56-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Plasma TiP2O7

Hardware used: Custom Remote Inductively Coupled Plasma
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
Trimethyl phosphate, TMP, (MeO)3PO
CAS#: 512-56-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 300C

Plasma N:TiP2O7

Hardware used: Custom Remote Inductively Coupled Plasma
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
Trimethyl phosphate, TMP, (MeO)3PO
CAS#: 512-56-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 300C

Plasma N:TiP2O7

Hardware used: Custom Remote Inductively Coupled Plasma
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
Trimethyl phosphate, TMP, (MeO)3PO
CAS#: 512-56-1
Where to buy precursor
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 300C

Plasma TiP2O7

Hardware used: Custom Remote Inductively Coupled Plasma
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
DEPA, diethylphosphoramidate
CAS#: 1068-21-9
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Plasma N:TiP2O7

Hardware used: Custom Remote Inductively Coupled Plasma
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
DEPA, diethylphosphoramidate
CAS#: 1068-21-9
O2, Oxygen
CAS#: 7782-44-7
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 300C

Plasma TiP2O7

Hardware used: Custom Remote Inductively Coupled Plasma
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
DEPA, diethylphosphoramidate
CAS#: 1068-21-9
O2, Oxygen
CAS#: 7782-44-7
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 300C

Plasma N:TiP2O7

Hardware used: Custom Remote Inductively Coupled Plasma
TTIP, titanium(IV) isopropoxide, Ti(O-i-Pr)4
CAS#: 546-68-9
Where to buy precursor
DEPA, diethylphosphoramidate
CAS#: 1068-21-9
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Characteristic: Thickness
Analysis: XRR, X-Ray Reflectivity
Diagnostic: Bruker D8 Advance

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Diagnostic: Bruker D8 Advance

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: Thermo VG-Scientific theta probe

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis
Diagnostic: -

Characteristic: Electrochemical Performance
Analysis: Electrochemical Analysis
Diagnostic: -

Substrates

Si(100)

Notes

Nice TMP and DEPA decomposition data
1720