Independent tuning of size and coverage of supported Pt nanoparticles using atomic layer deposition

Type:
Journal
Info:
NATURE COMMUNICATIONS | 8: 1074
Date:
2017-08-22
DOI:
http://dx.doi.org/10.1038/s41467-017-01140-z

Author Information

Name Institution
Jolien DendoovenGhent University
Ranjith K. RamachandranGhent University
Eduardo SolanoGhent University
Mert KurttepeliUniversity of Antwerp
Lisa GeertsKU Leuven
Gino HeremansKU Leuven
Jan RongéKU Leuven
Matthias M. MinjauwGhent University
Thomas DobbelaereGhent University
Kilian Devloo-CasierGhent University
Johan A. MartensKU Leuven
André VantommeKU Leuven
Sara BalsUniversity of Antwerp
Giuseppe PortaleEuropean Synchrotron Radiation Facility (ESRF)
Alessandro CoatiSynchrotron SOLEIL
Christophe DetavernierGhent University

Films

Thermal Pt

Hardware used: Custom
(Trimethyl)methylcyclopentadienylplatinum, MeCpMe3Pt
CAS#: 94442-22-5
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Plasma Pt

Hardware used: Custom
(Trimethyl)methylcyclopentadienylplatinum, MeCpMe3Pt
CAS#: 94442-22-5
Where to buy precursor
N2, Nitrogen
CAS#: 7727-37-9
Deposition Temperature = 300C

Film/Plasma Properties

Characteristic: Particle Surface Density
Analysis: XRF, X-Ray Fluorescence
Diagnostic: Synchrotron

Characteristic: Morphology, Roughness, Topography
Analysis: GISAXS, Grazing Incidence Small Angle X-ray Scattering
Diagnostic: Synchrotron

Characteristic: Morphology, Roughness, Topography
Analysis: Electron Tomography
Diagnostic: -

Characteristic: Particle Size Distribution
Analysis: HAADF, High-Angle Annular Dark Field
Diagnostic: FEI Titan

Substrates

Si with native oxide

Notes

1091