Low-Temperature Phase-Controlled Synthesis of Titanium Di- and Tri-sulfide by Atomic Layer Deposition

Type:
Journal
Info:
Chem. Mater. 2019, 31, 9354-9362
Date:
2019-10-25

Author Information

Name Institution
Saravana Balaji BasuvalingamEindhoven University of Technology
Yue ZhangEindhoven University of Technology
Matthew A. BloodgoodEindhoven University of Technology
Rasmus H. GodiksenEindhoven University of Technology
Alberto G. CurtoEindhoven University of Technology
Jan P. HofmannEindhoven University of Technology
Marcel A. VerheijenEurofins Materials Science
Erwin (W.M.M.) KesselsEindhoven University of Technology
Ageeth A. BolEindhoven University of Technology

Films



Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Bonding States
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: RBS, Rutherford Backscattering Spectrometry

Characteristic: Chemical Composition, Impurities
Analysis: TOF-ERDA, Time-Of-Flight Elastic Recoil Detection Analysis

Characteristic: Plasma Species
Analysis: OES, Optical Emission Spectroscopy

Characteristic: Resistivity, Sheet Resistance
Analysis: Four-point Probe

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence

Substrates

SiO2
Quartz

Notes

1714