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Publication Information
Title:
Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2014, 6 (9), pp 6731-6738
Date:
2014-04-08
Author Information
Name | Institution |
---|---|
Lae Ho Kim | Pohang University of Science and Technology (POSTECH) |
Films
Plasma Al2O3
Plasma AlTixOy
Film/Plasma Properties
Substrates
Keywords
Notes
202 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |