Publication Information

Title:
Al2O3/TiO2 Nanolaminate Thin Film Encapsulation for Organic Thin Film Transistors via Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
ACS Appl. Mater. Interfaces, 2014, 6 (9), pp 6731-6738
Date:
2014-04-08

Author Information

Name Institution
Lae Ho KimPohang University of Science and Technology (POSTECH)

Films

Plasma Al2O3



Film/Plasma Properties

Substrates

Keywords

Notes

202