Nanoscale Encapsulation of Hybrid Perovskites Using Hybrid Atomic Layer Deposition

Type:
Journal
Info:
J. Phys. Chem. Lett. 2022, 13, 4082-4089
Date:
2022-04-28
DOI:
http://dx.doi.org/10.1021/acs.jpclett.2c00862

Author Information

Name Institution
Jue GongFlorida State University
Moein AdnaniFlorida State University
Brendon T. JonesFlorida State University
Yan XinNational High Magnetic Field Laboratory
Sisi WangFlorida State University
Sawankumar V. PatelFlorida State University
Eric LochnerFlorida State University
Hedi MattoussiFlorida State University
Yan-Yan HuFlorida State University
Hanwei GaoFlorida State University

Films

Thermal Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature Range = 90-150C

Plasma Al2O3

Hardware used: Veeco - Ultratech - Cambridge NanoTech Fiji
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 90C

Film/Plasma Properties

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Diagnostic: -

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Diagnostic: -

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: -

Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Diagnostic: -

Substrates

MAPbI3, methylammonium lead iodide
2-mcpEtOH

Notes

1715