Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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On the Trail Ancient Worlds: Comparative Study of Commercial Scandium and Yttrium Precursors, Asgard, Midgard, Vanaheim and Olympus

Type:
Conference Proceedings
Info:
ALD 2024
Date:
2024-08-05
DOI:
https://ald2024.avs.org/

Author Information

Name Institution
Martin WilkenRuhr-University Bochum
Thilo HeppDockweiler Chemicals GmbH
Oliver BrielDockweiler Chemicals GmbH
A. MuriqiTyndall National Institute, University College Cork
C. ChoRuhr-University Bochum
M. G. NolanTyndall National Institute, University College Cork
Anjana DeviLeibniz Institute for Solid State and Materials Research

Films

Thermal Sc2O3

Hardware used: Unknown
ASGARD, (EtCp)2Sc(dbt)
CAS#: 0-0-0
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

1730