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Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells
Titanium oxynitride films for surface passivation of crystalline silicon deposited by plasma-enhanced atomic layer deposition to improve electrical conductivity
Probing the Origin and Suppression of Vertically Oriented Nanostructures of 2D WS2 Layers
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Publication Information
Title:
Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
Type:
Journal
Info:
Applied Physics Letters 103, 013107 (2013)
Date:
2013-06-17
Author Information
| Name | Institution |
|---|---|
| Taekyung Lim | Kyonggi University |
| Dongchool Kim | Kyonggi University |
| Sanghyun Ju | Kyonggi University |
Films
Film/Plasma Properties
Substrates
| Graphene |
Keywords
Notes
| TMA + H2O is a guess. |
| 606 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |