Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment

Type:
Journal
Info:
Applied Physics Letters 103, 013107 (2013)
Date:
2013-06-17

Author Information

Name Institution
Taekyung LimKyonggi University
Dongchool KimKyonggi University
Sanghyun JuKyonggi University

Films

Other Al2O3


Film/Plasma Properties

Substrates

Graphene

Notes

TMA + H2O is a guess.
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