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Publication Information
Title:
Direct deposition of aluminum oxide gate dielectric on graphene channel using nitrogen plasma treatment
Type:
Journal
Info:
Applied Physics Letters 103, 013107 (2013)
Date:
2013-06-17
Author Information
Name | Institution |
---|---|
Taekyung Lim | Kyonggi University |
Dongchool Kim | Kyonggi University |
Sanghyun Ju | Kyonggi University |
Films
Film/Plasma Properties
Substrates
Graphene |
Keywords
Notes
TMA + H2O is a guess. |
606 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |