Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Chemical Protection of Polycarbonate Surfaces by Atomic Layer Deposition of Alumina with Oxygen Plasma Pretreatment

Type:
Journal
Info:
Adv. Mater. Interfaces 2016, 3, 1600340
Date:
2016-06-21
DOI:
http://dx.doi.org/10.1002/admi.201600340

Author Information

Name Institution
Suk Won ParkKorea University
Kiho BaeKorea University
Jun Woo KimKorea University
Gyeong Beom LeeKorea University
Byoung-Ho ChoiKorea University
Min Hwan LeeUniversity of California - Merced
Joon Hyung ShimKorea University

Films

Other Al2O3

Hardware used: Unknown
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Polycarbonate

Notes

922