Effect of Oxygen Source on the Various Properties of SnO2 Thin Films Deposited by Plasma-Enhanced Atomic Layer Deposition
Type:
Journal
Info:
Coatings 2020, 10, 692
Date:
2020-07-18
Author Information
| Name | Institution |
|---|---|
| Jong Hyeon Won | Seoul National University of Science and Technology |
| Seong Ho Han | Korea Research Institute of Chemical Technology |
| Bo Keun Park | Korea Research Institute of Chemical Technology |
| Taek-Mo Chung | Korea Research Institute of Chemical Technology |
| Jeong Hwan Han | Seoul National University of Science and Technology |
Films
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Binding
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Compositional Depth Profiling
Analysis: SIMS, Secondary Ion Mass Spectrometry
Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Characteristic: Optical Bandgap
Analysis: UV-VIS Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: GIXRD, Grazing Incidence X-Ray Diffraction
Characteristic: Carrier Concentration
Analysis: Hall Measurements
Characteristic: Mobility
Analysis: Hall Measurements
Characteristic: Resistivity, Sheet Resistance
Analysis: Hall Measurements
Substrates
| Silicon |
| soda lime glass |
Notes
| 1611 |