
Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
Type:
Journal
Info:
Applied Surface Science 572 (2022) 151405
Date:
2021-09-23
Author Information
Name | Institution |
---|---|
Yoonseo Jang | Yonsei University |
Do Hwan Jung | Yonsei University |
Prakash R. Sultane | Institute for Basic Science |
Eric S. Larsen | Institute for Basic Science |
Christopher W. Bielawski | Institute for Basic Science |
Jungwoo Oh | Yonsei University |
Films
Plasma BeO
Thermal BeO
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements
Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
Si(100) |
Notes
1618 |