Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition

Type:
Journal
Info:
Applied Surface Science 572 (2022) 151405
Date:
2021-09-23

Author Information

Name Institution
Yoonseo JangYonsei University
Do Hwan JungYonsei University
Prakash R. SultaneInstitute for Basic Science
Eric S. LarsenInstitute for Basic Science
Christopher W. BielawskiInstitute for Basic Science
Jungwoo OhYonsei University

Films

Plasma BeO


Thermal BeO


Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: Electron Diffraction

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Leakage Current
Analysis: I-V, Current-Voltage Measurements

Characteristic: Breakdown Voltage
Analysis: I-V, Current-Voltage Measurements

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Si(100)

Notes

1618