Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition
Info:
Applied Surface Science 572 (2022) 151405
Author Information
Films
Film/Plasma Properties
Analysis: XRD, X-Ray Diffraction
Analysis: XRR, X-Ray Reflectivity
Analysis: TEM, Transmission Electron Microscope
Analysis: TEM, Transmission Electron Microscope
Analysis: Electron Diffraction
Analysis: XPS, X-ray Photoelectron Spectroscopy
Analysis: C-V, Capacitance-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Analysis: I-V, Current-Voltage Measurements
Analysis: AFM, Atomic Force Microscopy
Substrates
Notes