Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Plasma-assisted ALD to functionalize PET: towards new generation flexible gadgets

Type:
Journal
Info:
Flex. Print. Electron. 2 (2017) 022001
Date:
2017-04-03
DOI:
https://doi.org/10.1088/2058-8585/aa6add

Author Information

Name Institution
Ming FangBeijing Institute of Graphic Communication
H ZhangBeijing Institute of Graphic Communication
Lijun SangBeijing Institute of Graphic Communication
H CaoBeijing Institute of Graphic Communication
Lizhen YangBeijing Institute of Graphic Communication
K OstrikovQueensland University of Technology
I LevchenkoQueensland University of Technology
Qiang ChenBeijing Institute of Graphic Communication

Films

Other Al2O3

Hardware used: Custom
O2, Oxygen
CAS#: 7782-44-7
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature Range = 50-110C

Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Veeco diInnova

Characteristic: Wetting Angle
Analysis: Contact Angle Measurement
Diagnostic: DSA 100

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Diagnostic: VG Scientific ESCALAB 220iXL

Characteristic: Thickness
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon UVISEL

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: Horiba Jobin Yvon UVISEL

Characteristic: Diffusion Barrier Properties
Analysis: Water Vapor Transmission Rate (WVTR)
Diagnostic: Mocon Aquatron Model 1

Substrates

PET, Polyethylene Terephthalate
Si(100)

Notes

1018