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Plasma nitridation of atomic layer deposition (ALD) Al2O3 by NH3 in plasma-enhanced chemical vapor deposition (PECVD) for silicon solar cell
Type:
Journal
Info:
Surface & Coatings Technology 307, Part B (2016) 1096 - 1099
Date:
2016-05-19
Author Information
| Name | Institution |
|---|---|
| Young Joon Cho | Chungnam National University |
| Hamchorom Cha | Chungnam National University |
| Hyo Sik Chang | Chungnam National University |
Films
Film/Plasma Properties
Characteristic: Lifetime
Analysis: QSSPC, Quasi-Steady-State PhotoConductance Decay
Characteristic: Open Circuit Voltage
Analysis: QSSPC, Quasi-Steady-State PhotoConductance Decay
Characteristic: Compositional Depth Profiling
Analysis: SIMS, Secondary Ion Mass Spectrometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Photoluminescence
Analysis: PL, PhotoLuminescence
Substrates
| Silicon |
Notes
| 824 |