High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3

Type:
Journal
Info:
Materials 2019, 12, 1056
Date:
2019-03-27

Author Information

Name Institution
Ava KhosraviUniversity of Texas at Dallas
Rafik AddouUniversity of Texas at Dallas
Massimo CatalanoUniversity of Texas at Dallas
Jiyoung KimUniversity of Texas at Dallas
Robert M. WallaceUniversity of Texas at Dallas

Films


Plasma Al2O3


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Characteristic: Raman Spectra
Analysis: Raman Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: HAADF, High-Angle Annular Dark Field

Substrates

ReS2

Notes

1283