Title: High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
Type: Journal
Info: Materials 2019, 12, 1056
Date: 2019-03-27
DOI: http://dx.doi.org/10.3390/ma12071056
Name
Institution
University of Texas at Dallas
University of Texas at Dallas
University of Texas at Dallas
University of Texas at Dallas
University of Texas at Dallas
Characteristic
Analysis
Diagnostic
Chemical Composition, Impurities
XPS, X-ray Photoelectron Spectroscopy
Omicron EA125
Morphology, Roughness, Topography
AFM, Atomic Force Microscopy
Veeco Dimension 3100
Raman Spectra
Raman Spectroscopy
-
Crystallinity, Crystal Structure, Grain Size, Atomic Structure
HAADF, High-Angle Annular Dark Field
JEOL JEM ARM 200
ReS2
Plasma vs Thermal Comparison
1283
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