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High-κ Dielectric on ReS2: In-Situ Thermal Versus Plasma-Enhanced Atomic Layer Deposition of Al2O3
Type:
Journal
Info:
Materials 2019, 12, 1056
Date:
2019-03-27
Author Information
| Name | Institution |
|---|---|
| Ava Khosravi | University of Texas at Dallas |
| Rafik Addou | University of Texas at Dallas |
| Massimo Catalano | University of Texas at Dallas |
| Jiyoung Kim | University of Texas at Dallas |
| Robert M. Wallace | University of Texas at Dallas |
Films
Thermal Al2O3
Plasma Al2O3
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Characteristic: Raman Spectra
Analysis: Raman Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: HAADF, High-Angle Annular Dark Field
Substrates
| ReS2 |
Notes
| 1283 |