Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting

Type:
Journal
Info:
ACS Appl. Nano Mater. 2019, 2, 6277-6286
Date:
2019-10-02

Author Information

Name Institution
Matthias J. MüllerHelmholtz-Zentrum Berlin für Materialien und Energie GmbH
Kristina KomanderHelmholtz-Zentrum Berlin für Materialien und Energie GmbH
Christian HöhnHelmholtz-Zentrum Berlin für Materialien und Energie GmbH
Roel van de KrolHelmholtz-Zentrum Berlin für Materialien und Energie GmbH
Aafke C. BronnebergHelmholtz-Zentrum Berlin für Materialien und Energie GmbH

Films



Film/Plasma Properties

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Extinction Coefficient
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Images
Analysis: TEM, Transmission Electron Microscope

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Al2O3

Keywords

Plasma vs Thermal Comparison

Notes

See chapter 3 in on-line thesis.
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