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Growth of Bi2O3 Films by Thermal- and Plasma-Enhanced Atomic Layer Deposition Monitored with Real-Time Spectroscopic Ellipsometry for Photocatalytic Water Splitting
Type:
Journal
Info:
ACS Appl. Nano Mater. 2019, 2, 6277-6286
Date:
2019-10-02
Author Information
| Name | Institution |
|---|---|
| Matthias J. Müller | Helmholtz-Zentrum Berlin für Materialien und Energie GmbH |
| Kristina Komander | Helmholtz-Zentrum Berlin für Materialien und Energie GmbH |
| Christian Höhn | Helmholtz-Zentrum Berlin für Materialien und Energie GmbH |
| Roel van de Krol | Helmholtz-Zentrum Berlin für Materialien und Energie GmbH |
| Aafke C. Bronneberg | Helmholtz-Zentrum Berlin für Materialien und Energie GmbH |
Films
Thermal Bi2O3
Plasma Bi2O3
Film/Plasma Properties
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Extinction Coefficient
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction
Characteristic: Images
Analysis: TEM, Transmission Electron Microscope
Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Al2O3 |
Notes
| See chapter 3 in on-line thesis. |
| 1592 |