Publication Information

Title:
Effect of Hydrogen in Gate Insulator on NBIS Performance of Oxide Thin Film Transistor
Type:
Conference Proceedings
Info:
IMID 2015 Digest
Date:
2015-08-19

Author Information

Name Institution
Kyoung Woo ParkKorea Advanced Institute of Science and Technology
Yun Yong NamKorea Advanced Institute of Science and Technology
Kwang Hum LeeKorea Advanced Institute of Science and Technology
Gum Bi MunKorea Advanced Institute of Science and Technology
Jong Bum KoKorea Advanced Institute of Science and Technology
Hye In YeomKorea Advanced Institute of Science and Technology
Sang-Hee Ko ParkKorea Advanced Institute of Science and Technology

Films

Thermal Al2O3


Plasma Al2O3


Film/Plasma Properties

Substrates

Keywords

Plasma vs Thermal Comparison

Notes

460