Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Experimental verification of electro-refractive phase modulation in graphene

Type:
Journal
Info:
Scientific Reports 5, Article number: 10967 (2015)
Date:
2015-05-12
DOI:
http://dx.doi.org/10.1038/srep10967

Author Information

Name Institution
Muhammad MohsinApplied Micro and Optoelectronic (AMO) GmbH
Daniel NeumaierApplied Micro and Optoelectronic (AMO) GmbH
Daniel SchallApplied Micro and Optoelectronic (AMO) GmbH
Martin OttoApplied Micro and Optoelectronic (AMO) GmbH
Christopher MatheisenApplied Micro and Optoelectronic (AMO) GmbH
Anna Lena GieseckeApplied Micro and Optoelectronic (AMO) GmbH
Abhay A. SagadeApplied Micro and Optoelectronic (AMO) GmbH
Heinrich KurzApplied Micro and Optoelectronic (AMO) GmbH

Films

Plasma Al2O3

Hardware used: Unknown
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 300C

Thermal Al2O3

Hardware used: Unknown
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
H2O, Water
CAS#: 7732-18-5
Where to buy precursor
Deposition Temperature = 150C

Film/Plasma Properties

Substrates

HSQ, Hydrogen SilsesQuioxane

Notes

Plasma and thermal ALD Al2O3 films used in graphene-based electro-refractive phase modulation device.
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