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Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
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Publication Information
Title:
Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
Type:
Journal
Info:
Appl. Phys. Lett. 104, 192104 (2014)
Date:
2014-05-03
Author Information
| Name | Institution |
|---|---|
| Takafumi Kamimura | National Institute of Information and Communications Technology |
Films
Film/Plasma Properties
Characteristic: Band Alignment
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Ga2O3 |
Keywords
| Heterojunctions |
Notes
| 242 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |