2021 Year in Review
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202 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
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88 Theses
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Tailoring angular selectivity in SiO2 slanted columnar thin films using atomic layer deposition of titanium nitride
Characterization of Molybdenum Oxide Thin Films Grown by Atomic Layer Deposition
Thermal Interface Enhancement via Inclusion of an Adhesive Layer Using Plasma-Enhanced Atomic Layer Deposition
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Band alignment and electrical properties of Al2O3/β-Ga2O3 heterojunctions
Type:
Journal
Info:
Appl. Phys. Lett. 104, 192104 (2014)
Date:
2014-05-03
Author Information
| Name | Institution |
|---|---|
| Takafumi Kamimura | National Institute of Information and Communications Technology |
Films
Film/Plasma Properties
Characteristic: Band Alignment
Analysis: XPS, X-ray Photoelectron Spectroscopy
Substrates
| Ga2O3 |
Keywords
| Heterojunctions |
Notes
| 242 |