The publication database currently has 1509 entries.
Search from:
188 Films Compositions
401 Precursors and Plasma Gases
73 Deposition Hardwares
238 Film and Plasma Characteristics
79 Theses
Use Multifactor Search for more complex searches and for searching by other criteria (author, affiliation, analysis, deposition temperature)
ALD Links
About plasma-ald.com
Contact Us
Advertising
Recent Database Additions
Carbon content control of silicon oxycarbide film with methane containing plasma
Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
Search 1509 plasma ALD publications by:
Search 1509 plasma ALD publications by:
Publication Information
Title:
Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
Type:
Conference Proceedings
Info:
ECS Trans. 2014 volume 61, issue 2, 293-300
Date:
2014-08-24
Author Information
| Name | Institution |
|---|---|
| Toshihide Nabatame | National Institute for Materials Science (NIMS) |
Films
Film/Plasma Properties
Characteristic: Flat Band Voltage Shift
Analysis: -
Substrates
Keywords
| Flash Memory |
| Capacitors |
Notes
| 244 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |