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203 Films Compositions
272 Precursors and Plasma Gases
77 Deposition Hardwares
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90 Theses
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Effect of atomic layer plasma treatment on TALD-ZrO2 film to improve the corrosion protection of Mg-Ca alloy
Deposition and Characterization of RP-ALD SiO2 Thin Films with Different Oxygen Plasma Powers
Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation
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Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
Type:
Conference Proceedings
Info:
ECS Trans. 2014 volume 61, issue 2, 293-300
Date:
2014-08-24
Author Information
| Name | Institution |
|---|---|
| Toshihide Nabatame | National Institute for Materials Science (NIMS) |
Films
Film/Plasma Properties
Characteristic: Flat Band Voltage Shift
Analysis: -
Substrates
Keywords
| Flash Memory |
| Capacitors |
Notes
| 244 |