Publication Information

Title:
Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer
Type:
Conference Proceedings
Info:
ECS Trans. 2014 volume 61, issue 2, 293-300
Date:
2014-08-24

Author Information

Name Institution
Toshihide NabatameNational Institute for Materials Science (NIMS)

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Flat Band Voltage Shift
Analysis: -

Substrates

Keywords

Flash Memory
Capacitors

Notes

244