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Publication Information

Title: Characteristics of Charge Trap Flash Memory with Al2O3/(Ta/Nb)Ox/Al2O3 Multi-Layer

Type: Conference Proceedings

Info: ECS Trans. 2014 volume 61, issue 2, 293-300

Date: 2014-08-24

DOI: http://dx.doi.org/10.1149/06102.0293ecst

Author Information

Name

Institution

Toshihide Nabatame

National Institute for Materials Science (NIMS)

Films

Plasma Al2O3 using Unknown

Deposition Temperature = 200C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH3)3, AlMe3, Al2(CH3)6, Al2Me6

75-24-1

Where to buy precursor

Oxygen, O2

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Flat Band Voltage Shift

Unknown

Unknown

Substrates

Keywords

Flash Memory

Capacitors

Notes

244

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I am sure there are papers I have not found. I am sure there is an occasional typo or omission in the database entries. If you know of publications I have missed or a database entry is wrong, send me an email at: marksowa@plasma-ald.com

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