Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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46-2: Multi-Level-Pressure Touch Sensors with P(VDF-TrFE) Deposited on Metal Oxide Thin Film Transistor

Type:
Conference Proceedings
Info:
2016 SID Symposium Digest of Technical Papers
Date:
2016-05-26
DOI:
http://dx.doi.org/10.1002/sdtp.10764

Author Information

Name Institution
Taiyu JinKorea Advanced Institute of Science and Technology
Jeongjae RyuKorea Advanced Institute of Science and Technology
HanSaem KangLG Display Co. Ltd.
Kwangsoo NoKorea Advanced Institute of Science and Technology
Sang-Hee Ko ParkKorea Advanced Institute of Science and Technology

Films

Plasma Al2O3

Hardware used: CN1 Atomic Premium
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Notes

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