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Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
Type:
Journal
Info:
Thin Solid Films 534 (2013) 515 - 519
Date:
2013-02-25
Author Information
| Name | Institution |
|---|---|
| Jong Geol Lee | Kyung Hee University |
| Hyun Gi Kim | Kyung Hee University |
| Sung Soo Kim | Kyung Hee University |
Films
Film/Plasma Properties
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Water Vapor Transmission Rate (WVTR)
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test
Characteristic: Thickness
Analysis: Ellipsometry
Characteristic: Refractive Index
Analysis: Ellipsometry
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| PEN, Polyethylene Napthalate |
Notes
| 567 |