Publication Information

Title:
Enhancement of barrier properties of aluminum oxide layer by optimization of plasma-enhanced atomic layer deposition process
Type:
Journal
Info:
Thin Solid Films 534 (2013) 515 - 519
Date:
2013-02-25

Author Information

Name Institution
Jong Geol LeeKyung Hee University
Hyun Gi KimKyung Hee University
Sung Soo KimKyung Hee University

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Water Vapor Transmission Rate (WVTR)

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test

Characteristic: Thickness
Analysis: Ellipsometry

Characteristic: Refractive Index
Analysis: Ellipsometry

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

PEN, Polyethylene Napthalate

Keywords

Notes

567