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196 Films Compositions
265 Precursors and Plasma Gases
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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 33, 06FG02 (2015)
Date:
2015-09-21
Author Information
| Name | Institution |
|---|---|
| Golnaz Karbasian | University of Notre Dame |
| Alexei O. Orlov | University of Notre Dame |
| Gregory L. Snider | University of Notre Dame |
Films
Film/Plasma Properties
Substrates
| SiO2 |
| Ni |
Keywords
Notes
| 397 |