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Carbon content control of silicon oxycarbide film with methane containing plasma
Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
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Publication Information
Title:
Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 33, 06FG02 (2015)
Date:
2015-09-21
Author Information
| Name | Institution |
|---|---|
| Golnaz Karbasian | University of Notre Dame |
| Alexei O. Orlov | University of Notre Dame |
| Gregory L. Snider | University of Notre Dame |
Films
Film/Plasma Properties
Substrates
| SiO2 |
| Ni |
Keywords
Notes
| 397 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |