Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier

Type:
Journal
Info:
Journal of Vacuum Science & Technology B 33, 06FG02 (2015)
Date:
2015-09-21

Author Information

Name Institution
Golnaz KarbasianUniversity of Notre Dame
Alexei P. OrlovUniversity of Notre Dame
Gregory L. SniderUniversity of Notre Dame

Films

Plasma Al2O3


Film/Plasma Properties

Substrates

SiO2
Ni

Notes

397