The publication database currently has 1636 entries.
203 Films Compositions
274 Precursors and Plasma Gases
77 Deposition Hardwares
251 Film and Plasma Characteristics
91 Theses
5041 Authors
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Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors
Atomic layer deposition of ferroelectric Hf0.5Zr0.5O2 on single-layer, CVD-grown graphene
Electron-enhanced atomic layer deposition of silicon thin films at room temperature
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Fabrication of nanodamascene metallic single electron transistors with atomic layer deposition of tunnel barrier
Type:
Journal
Info:
Journal of Vacuum Science & Technology B 33, 06FG02 (2015)
Date:
2015-09-21
Author Information
| Name | Institution |
|---|---|
| Golnaz Karbasian | University of Notre Dame |
| Alexei P. Orlov | University of Notre Dame |
| Gregory L. Snider | University of Notre Dame |
Films
Film/Plasma Properties
Substrates
| SiO2 |
| Ni |
Keywords
Notes
| 397 |