Capacitance spectroscopy of gate-defined electronic lattices

Type:
Journal
Info:
Arxiv.org preprint
Date:
2017-09-26

Author Information

Name Institution
T. HensgensDelft University of Technology
U. MukhopadhyayDelft University of Technology
P. BarthelemyDelft University of Technology
R. F. L. VermeulenDelft University of Technology
R. N. SchoutenDelft University of Technology
S. FallahiPurdue University
G. C. GardnerPurdue University
C. ReichlETH Zürich
W. WegscheiderETH Zürich
Michael J. ManfraPurdue University
L. M. K. VandersypenDelft University of Technology

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Adhesion
Analysis: -

Characteristic: Hysteresis
Analysis: -

Substrates

Notes

1057