Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Stretchable Carbon Nanotube Charge-Trap Floating-Gate Memory and Logic Devices for Wearable Electronics

Type:
Journal
Info:
ACS Nano, 9, 2015, (5), pp 5585-5593
Date:
2015-04-21
DOI:
http://dx.doi.org/10.1021/acsnano.5b01848

Author Information

Name Institution
Donghee SonKorean Basic Science Institute
Ja Hoon KooKorean Basic Science Institute
Jun-Kyul SongKorean Basic Science Institute
Jae-Min KimKorean Basic Science Institute
Mincheol LeeKorean Basic Science Institute
Hyung Joon ShimKorean Basic Science Institute
Minjoon ParkKorean Basic Science Institute
Minbaek LeeInha University
Ji Hoon KimPusan National University
Dae-Hyeong KimKorean Basic Science Institute

Films

Plasma Al2O3

Hardware used: Unknown
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Au

Notes

533