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Search 1531 plasma ALD publications by:
Publication Information
Title:
Capacitance-voltage characterization of Al2O3/GaN-on-insulator (GaNOI) structures with TMAH surface treatment
Type:
Journal
Info:
Microelectronic Engineering 178 (2017) 217 - 220
Date:
2017-05-12
Author Information
Name | Institution |
---|---|
Ki-Sik Im | Kyungpook National University |
Jeong-Gil Kim | Kyungpook National University |
Sindhuri Vodapally | Kyungpook National University |
Raphaƫl Caulmilone | SOITEC |
Sorin Cristoloveanu | Institut National Polytechnique de Grenoble - INPG |
Jung-Hee Lee | Kyungpook National University |
Films
Film/Plasma Properties
Characteristic: Capacitance
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Dielectric Constant, Permittivity
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Flat Band Voltage Shift
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Effective Oxide Charge, Qeff
Analysis: C-V, Capacitance-Voltage Measurements
Characteristic: Interface Trap Density
Analysis: C-V, Capacitance-Voltage Measurements
Substrates
GaN |
Keywords
Notes
1037 |
Popular Precursors
Top Authors
Erwin (W.M.M.) Kessels |
Hyeongtag Jeon |
Hyungjun Kim |
Mauritius C. M. (Richard) van de Sanden |
Christophe Detavernier |