Publication Information

Title:
Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films
Type:
Journal
Info:
Nano-Micro Lett. (2017) 9: 29
Date:
2017-01-10

Author Information

Name Institution
Dainan ZhangUniversity of Electronic Science and Technology of China
Tian-Long WenUniversity of Electronic Science and Technology of China
Ying XiongUniversity of Electronic Science and Technology of China
Donghong QiuUniversity of Electronic Science and Technology of China
Qi-Ye WenUniversity of Electronic Science and Technology of China

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Crystallinity, Crystal Structure, Grain Size, Atomic Structure
Analysis: XRD, X-Ray Diffraction

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Si(001)

Keywords

Notes

987