Publication Information

Title: Effect of Al2O3 Buffer Layers on the Properties of Sputtered VO2 Thin Films

Type: Journal

Info: Nano-Micro Lett. (2017) 9: 29

Date: 2017-01-10

DOI: http://dx.doi.org/10.1007/s40820-017-0132-x

Author Information

Name

Institution

University of Electronic Science and Technology of China

University of Electronic Science and Technology of China

University of Electronic Science and Technology of China

University of Electronic Science and Technology of China

University of Electronic Science and Technology of China

Films

Plasma Al2O3 using Unknown

Deposition Temperature Range N/A

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Morphology, Roughness, Topography

SEM, Scanning Electron Microscopy

JEOL JSM-7600F

Crystallinity, Crystal Structure, Grain Size, Atomic Structure

XRD, X-Ray Diffraction

Angstrom Advanced DX-2700

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Seiko Instruments SPA-300HV

Substrates

Si(001)

Keywords

Notes

987



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