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203 Films Compositions

272 Precursors and Plasma Gases

77 Deposition Hardwares

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Effect of atomic layer plasma treatment on TALD-ZrO₂ film to improve the corrosion protection of Mg-Ca alloy Deposition and Characterization of RP-ALD SiO₂ Thin Films with Different Oxygen Plasma Powers Electrochemical Activation of Atomic Layer-Deposited Cobalt Phosphate Electrocatalysts for Water Oxidation

Search 1628 plasma ALD publications by:

203 Films Compositions

272 Precursors and Plasma Gases

77 Deposition Hardwares

251 Film and Plasma Characteristics

Al₂O₃ multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition

Type:

Journal

Info:

JOURNAL OF APPLIED PHYSICS 115, 073502 (2014)

Date:

2014-02-05

DOI:

http://dx.doi.org/10.1063/1.4866001

Author Information

Name	Institution
Hyunsoo Jung	Hanyang University

Films

Plasma Al₂O₃

Hardware used: Custom

TMA, trimethyl aluminum, AlMe₃

CAS#: 75-24-1

Where to buy precursor

O₂, Oxygen

CAS#: 7782-44-7

Deposition Temperature = 100C

Film/Plasma Properties

Substrates

Keywords

Notes

201