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Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
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Publication Information
Title:
Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition
Type:
Journal
Info:
JOURNAL OF APPLIED PHYSICS 115, 073502 (2014)
Date:
2014-02-05
Author Information
| Name | Institution |
|---|---|
| Hyunsoo Jung | Hanyang University |
Films
Film/Plasma Properties
Substrates
Keywords
Notes
| 201 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |