Publication Information

Title: Al2O3 multi-density layer structure as a moisture permeation barrier deposited by radio frequency remote plasma atomic layer deposition

Type: Journal

Info: JOURNAL OF APPLIED PHYSICS 115, 073502 (2014)

Date: 2014-02-05

DOI: http://dx.doi.org/10.1063/1.4866001

Author Information

Name

Institution

Hyunsoo Jung

Hanyang University

Films

Plasma Al2O3 using Custom

Deposition Temperature = 100C

TMA, Trimethyl Aluminum, Trimethylalane, Trimethylaluminium, Aluminium Trimethyl, Aluminum Trimethanide, Al(CH3)3, AlMe3, Al2(CH3)6, Al2Me6

75-24-1

Where to buy precursor

Oxygen, O2

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Notes

201


Mark Sowa

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