Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Detection of Streptavidin-Biotin Complexes Using a Highly Sensitive AlGaN/GaN-Based Extended-Gate MISHEMT-Type Biosensor

Type:
Journal
Info:
Journal of Sensor Science and Technology Vol. 25, No. 5 (2016) pp. 320-325
Date:
2016-09-30
DOI:
http://dx.doi.org/10.5369/JSST.2016.25.5.320

Author Information

Name Institution
Hee Ho LeeKyungpook National University
Myunghan BaeKyungpook National University
Byoung-Soo ChoiKyungpook National University
Jang-Kyoo ShinKyungpook National University

Films

Plasma Al2O3

Hardware used: Unknown
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

AlGaN

Notes

924