Publication Information

Title:
Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
Type:
Journal
Info:
Japanese Journal of Applied Physics 52, 035502 (2013)
Date:
2013-01-19

Author Information

Name Institution
Hagyoung ChoiHanyang University
Sanghun LeeHanyang University
Hyunsoo JungHanyang University
Seokyoon ShinHanyang University
Giyul HamHanyang University
Hyungtak SeoAjou University
Hyeongtag JeonHanyang University

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test

Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy

Characteristic: Density
Analysis: XRR, X-Ray Reflectivity

Characteristic: Chemical Binding
Analysis: FTIR, Fourier Transform InfraRed spectroscopy

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy

Substrates

Si(100)
PES, Poly(Ether Sulfone)

Keywords

Encapsulation
Diffusion Barrier

Notes

573