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Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures
Type:
Journal
Info:
Japanese Journal of Applied Physics 52, 035502 (2013)
Date:
2013-01-19
Author Information
| Name | Institution |
|---|---|
| Hagyoung Choi | Hanyang University |
| Sanghun Lee | Hanyang University |
| Hyunsoo Jung | Hanyang University |
| Seokyoon Shin | Hanyang University |
| Giyul Ham | Hanyang University |
| Hyungtak Seo | Ajou University |
| Hyeongtag Jeon | Hanyang University |
Films
Film/Plasma Properties
Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy
Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test
Characteristic: Thickness
Analysis: SEM, Scanning Electron Microscopy
Characteristic: Chemical Composition, Impurities
Analysis: AES, Auger Electron Spectroscopy
Characteristic: Density
Analysis: XRR, X-Ray Reflectivity
Characteristic: Chemical Binding
Analysis: FTIR, Fourier Transform InfraRed spectroscopy
Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Substrates
| Si(100) |
| PES, Poly(Ether Sulfone) |
Notes
| 573 |