Publication Information

Title: Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures

Type: Journal

Info: Japanese Journal of Applied Physics 52, 035502 (2013)

Date: 2013-01-19

DOI: http://dx.doi.org/10.7567/JJAP.52.035502

Author Information

Name

Institution

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Ajou University

Hanyang University

Films

Plasma Al2O3 using Custom

Deposition Temperature Range = 50-200C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

VG Scientific ESCALAB 220iXL

Water Vapor Transmission Rate (WVTR)

Calcium Test

Custom

Thickness

SEM, Scanning Electron Microscopy

-

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

-

Density

XRR, X-Ray Reflectivity

-

Chemical Binding

FTIR, Fourier Transform InfraRed spectroscopy

-

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

-

Substrates

Si(100)

PES, Poly(Ether Sulfone)

Keywords

Encapsulation

Diffusion Barrier

Notes

573



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