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Publication Information

Title: Moisture Barrier Properties of Al2O3 Films deposited by Remote Plasma Atomic Layer Deposition at Low Temperatures

Type: Journal

Info: Japanese Journal of Applied Physics 52, 035502 (2013)

Date: 2013-01-19

DOI: http://dx.doi.org/10.7567/JJAP.52.035502

Author Information

Name

Institution

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Hanyang University

Ajou University

Hanyang University

Films

Plasma Al2O3 using Custom

Deposition Temperature Range = 50-200C

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

VG Scientific ESCALAB 220iXL

Water Vapor Transmission Rate (WVTR)

Calcium Test

Custom

Thickness

SEM, Scanning Electron Microscopy

Unknown

Chemical Composition, Impurities

AES, Auger Electron Spectroscopy

Unknown

Density

XRR, X-Ray Reflectivity

Unknown

Chemical Binding

FTIR, Fourier Transform InfraRed spectroscopy

Unknown

Morphology, Roughness, Topography

AFM, Atomic Force Microscopy

Unknown

Substrates

Si(100)

PES, Poly(Ether Sulfone)

Keywords

Encapsulation

Diffusion Barrier

Notes

573



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