Publication Information

Title: DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors

Type: Journal

Info: Theor Chem Acc (2016) 135:152

Date: 2016-04-25

DOI: http://dx.doi.org/10.1007/s00214-016-1900-2

Author Information

Name

Institution

Moscow State University

Moscow State University

University of Namur

Moscow State University

Films

Plasma Al2O3 using Unknown

Deposition Temperature Range N/A

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

Keywords

Modeling

Notes

790



Shortcuts



© 2014-2019 plasma-ald.com