DFT modeling of plasma-assisted atomic layer deposition for Si(110) passivation: formation of boehmite-like chains as γ-Al2O3 precursors

Type:
Journal
Info:
Theor Chem Acc (2016) 135:152
Date:
2016-04-25

Author Information

Name Institution
Andrey A. RybakovMoscow State University
Alexander V. LarinMoscow State University
Daniel P. VercauterenUniversity of Namur
Georgy M. ZhidomirovMoscow State University

Films

Plasma Al2O3


Film/Plasma Properties

Substrates

Notes

790