Advanced thin gas barriers film incorporating alternating structure of PEALD-based Al2O3/organic-inorganic nanohybrid layers

Type:
Journal
Info:
Applied Surface Science 475 (2019) 926 - 933
Date:
2018-12-31
DOI:
https://doi.org/10.1016/j.apsusc.2018.12.296

Author Information

Name Institution
Jin Hyuk JangPohang University of Science and Technology (POSTECH)
Nahae KimKangwon National University
Xinlin LiYeungnam University
Tae Kyu AnKorea National University of Transportation
Juyoung KimKangwon National University
Se Hyun KimYeungnam University

Films

Plasma Al2O3

Hardware used: Leintech LTSR-150
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Film/Plasma Properties

Characteristic: Water Vapor Transmission Rate (WVTR)
Analysis: Calcium Test
Diagnostic: -

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope
Diagnostic: JEOL 2100F

Characteristic: Morphology, Roughness, Topography
Analysis: AFM, Atomic Force Microscopy
Diagnostic: Digital Instrument D3000

Characteristic: Morphology, Roughness, Topography
Analysis: Optical Microscopy
Diagnostic: -

Characteristic: Transmittance
Analysis: UV-VIS Spectroscopy
Diagnostic: JASCO V-650

Characteristic: Refractive Index
Analysis: Ellipsometry
Diagnostic: J.A. Woollam M-2000

Substrates

Glass
PEN, Polyethylene Napthalate
PET, Polyethylene Terephthalate
Si(100)

Notes

1521