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Characterization of thin Al2O3/SiO2 dielectric stack for CMOS transistors
Designing Multifunctional Cobalt Oxide Layers for Efficient and Stable Electrochemical Oxygen Evolution
Hierarchical Atomic Layer Deposited V2O5 on 3D Printed Nanocarbon Electrodes for High-Performance Aqueous Zinc-Ion Batteries
Piezoelectric Properties of Zinc Oxide Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
Experimental and numerical analysis of the effects of ion bombardment in silicon oxide (SiO2) plasma enhanced atomic layer deposition (PEALD) processes
Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
Type:
Journal
Info:
Journal of Applied Physics 121, 185702 (2017)
Date:
2017-04-23
Author Information
| Name | Institution |
|---|---|
| Tim Niewelt | Fraunhofer Institute for Solar Energy Systems (ISE) |
| Marisa Selinger | Fraunhofer Institute for Solar Energy Systems (ISE) |
| N. E. Grant | University of Warwick |
| Wolfram Kwapil | Fraunhofer Institute for Solar Energy Systems (ISE) |
| J. D. Murphy | University of Warwick |
| Martin C. Schubert | Fraunhofer Institute for Solar Energy Systems (ISE) |
Films
Film/Plasma Properties
Substrates
| Silicon |
Keywords
| Solar |
| Passivation |
Notes
| 1029 |