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Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facets
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Publication Information
Title:
Light-induced activation and deactivation of bulk defects in boron-doped float-zone silicon
Type:
Journal
Info:
Journal of Applied Physics 121, 185702 (2017)
Date:
2017-04-23
Author Information
| Name | Institution |
|---|---|
| Tim Niewelt | Fraunhofer Institute for Solar Energy Systems (ISE) |
| Marisa Selinger | Fraunhofer Institute for Solar Energy Systems (ISE) |
| N. E. Grant | University of Warwick |
| Wolfram Kwapil | Fraunhofer Institute for Solar Energy Systems (ISE) |
| J. D. Murphy | University of Warwick |
| Martin C. Schubert | Fraunhofer Institute for Solar Energy Systems (ISE) |
Films
Film/Plasma Properties
Substrates
| Silicon |
Keywords
| Solar |
| Passivation |
Notes
| 1029 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |