Publication Information

Title:
Control of ion-flux and ion-energy in direct inductively coupled plasma reactor for interfacial-mixing plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Journal of Vacuum Science & Technology A 38, 032408 (2020)
Date:
2020-03-13

Author Information

Name Institution
Masaki HirayamaTohoku University
Akinobu TeramotoTohoku University
Shigetoshi SugawaTohoku University

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Thickness
Analysis: TEM, Transmission Electron Microscope

Characteristic: Microstructure
Analysis: TEM, Transmission Electron Microscope

Characteristic: Morphology, Roughness, Topography
Analysis: TEM, Transmission Electron Microscope

Characteristic: Morphology, Roughness, Topography
Analysis: SEM, Scanning Electron Microscopy

Characteristic: Ion Energy
Analysis: Langmuir Probe

Characteristic: Ion Flux
Analysis: Langmuir Probe

Characteristic: Electron Density, ne
Analysis: Langmuir Probe

Characteristic: Electron Temperature, Te
Analysis: Langmuir Probe

Characteristic: Ion Energy
Analysis: Planar Probe

Characteristic: Ion Flux
Analysis: Planar Probe

Substrates

Si(100)
SiO2

Keywords

Notes

1489