Publication Information

Title: Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors

Type: Journal

Info: RSC Adv., 2016, 6, 106374-106379

Date: 2016-11-03

DOI: http://dx.doi.org/10.1039/C6RA22423G

Author Information

Name

Institution

Po-Tsun Liu

National Chiao Tung University

Chih-Hsiang Chang

National Chiao Tung University

Chur-Shyang Fuh

National Chiao Tung University

Films

Plasma Al2O3 using Unknown

Deposition Temperature = 250C

TMA, AlMe3, Trimethyl Aluminum

75-24-1

Where to buy precursor

O2, Oxygen

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Substrates

ITO

IZTO

Keywords

Passivation

Notes

936


Mark Sowa

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