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The publication database currently has 1567 entries.

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195 Films Compositions

265 Precursors and Plasma Gases

76 Deposition Hardwares

242 Film and Plasma Characteristics

84 Theses

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In vacuo investigations on the nucleation of TaCN by plasma enhanced atomic layer deposition In vacuo studies on plasma-enhanced atomic layer deposition of cobalt thin films Influence of oxygen source on the ferroelectric properties of ALD grown Hf_1-xZr_xO₂ films

Search 1567 plasma ALD publications by:

195 Films Compositions

265 Precursors and Plasma Gases

76 Deposition Hardwares

242 Film and Plasma Characteristics

Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors

Type:

Journal

Info:

RSC Adv., 2016, 6, 106374-106379

Date:

2016-11-03

DOI:

http://dx.doi.org/10.1039/C6RA22423G

Author Information

Name	Institution
Po-Tsun Liu	National Chiao Tung University
Chih-Hsiang Chang	National Chiao Tung University
Chur-Shyang Fuh	National Chiao Tung University

Films

Plasma Al₂O₃

Hardware used: Unknown

TMA, AlMe₃, Trimethyl Aluminum

CAS#: 75-24-1

Where to buy precursor

O₂, Oxygen

CAS#: 7782-44-7

Deposition Temperature = 250C

Film/Plasma Properties

Substrates

ITO
IZTO

Keywords

Passivation

Notes

936