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Initial and steady-state Ru growth by atomic layer deposition studied by in situ Angle Resolved X-ray Photoelectron Spectroscopy
Innovative remote plasma source for atomic layer deposition for GaN devices
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition
Optical in situ monitoring of plasma-enhanced atomic layer deposition process
The role of active species in the N2 and N2-H2 RF afterglows on selective surface nitriding of ALD-grown TiO2 films
Enhancement of reliability and stability for transparent amorphous indium-zinc-tin-oxide thin film transistors
Type:
Journal
Info:
RSC Adv., 2016, 6, 106374-106379
Date:
2016-11-03
Author Information
| Name | Institution |
|---|---|
| Po-Tsun Liu | National Chiao Tung University |
| Chih-Hsiang Chang | National Chiao Tung University |
| Chur-Shyang Fuh | National Chiao Tung University |
Films
Film/Plasma Properties
Substrates
| ITO |
| IZTO |
Keywords
| Passivation |
Notes
| 936 |