Publication Information

Title:
First principles mechanistic study of self-limiting oxidative adsorption of remote oxygen plasma during the atomic layer deposition of alumina
Type:
Journal
Info:
Phys. Chem. Chem. Phys., 2018, 20, 22783-22795
Date:
2018-08-17

Author Information

Name Institution
Glen N. FomengiaTyndall National Institute, University College Cork
M. G. NolanTyndall National Institute, University College Cork
Simon D. ElliottSchrödinger

Films

Plasma Al2O3


Film/Plasma Properties

Substrates

Keywords

Modeling

Notes

1280