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Plasma-enhanced atomic layer deposition of gallium nitride thin films on fluorine-doped tin oxide glass substrate for future photovoltaic application
Plasma enhanced atomic layer deposition of thin film Li1+xMn2-xO4 for realization of all solid-state 3D lithium-ion microbatteries
AlN PEALD with TMA and forming gas: study of plasma reaction mechanisms
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Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
Type:
Journal
Info:
Lab Chip, 2015,15, 2887-2895
Date:
2015-05-25
Author Information
| Name | Institution |
|---|---|
| Daniel Czurratis | Robert Bosch GmbH |
| Yvonne Beyl | Robert Bosch GmbH |
| Alexander Grimm | Robert Bosch GmbH |
| Thomas Brettschneider | Robert Bosch GmbH |
| Sven Zinober | Robert Bosch GmbH |
| Franz Lärmer | Robert Bosch GmbH |
| Roland Zengerle | University of Freiburg |
Films
Film/Plasma Properties
Substrates
| Polycarbonate |
Keywords
Notes
| 501 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |