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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
Type:
Journal
Info:
Lab Chip, 2015,15, 2887-2895
Date:
2015-05-25
Author Information
| Name | Institution |
|---|---|
| Daniel Czurratis | Robert Bosch GmbH |
| Yvonne Beyl | Robert Bosch GmbH |
| Alexander Grimm | Robert Bosch GmbH |
| Thomas Brettschneider | Robert Bosch GmbH |
| Sven Zinober | Robert Bosch GmbH |
| Franz Lärmer | Robert Bosch GmbH |
| Roland Zengerle | University of Freiburg |
Films
Film/Plasma Properties
Substrates
| Polycarbonate |
Keywords
Notes
| 501 |