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Electrochemical Performance of Lithium-Nickel Oxide Thin Films Obtained with Use of Atomic Layer Deposition
Study of the surface species during thermal and plasma-enhanced atomic layer deposition of titanium oxide films using in situ IR-spectroscopy and in vacuo X-ray photoelectron spectroscopy
Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
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Publication Information
Title:
Liquids on-chip: direct storage and release employing micro-perforated vapor barrier films
Type:
Journal
Info:
Lab Chip, 2015,15, 2887-2895
Date:
2015-05-25
Author Information
| Name | Institution |
|---|---|
| Daniel Czurratis | Robert Bosch GmbH |
| Yvonne Beyl | Robert Bosch GmbH |
| Alexander Grimm | Robert Bosch GmbH |
| Thomas Brettschneider | Robert Bosch GmbH |
| Sven Zinober | Robert Bosch GmbH |
| Franz Lärmer | Robert Bosch GmbH |
| Roland Zengerle | University of Freiburg |
Films
Film/Plasma Properties
Substrates
| Polycarbonate |
Keywords
Notes
| 501 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |