Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.


Dynamic tuning of plasmon resonance in the visible using graphene

Type:
Journal
Info:
Optics Letters Vol. 41, Issue 6, pp. 1241--1244 (2016)
Date:
2016-02-09
DOI:
http://dx.doi.org/10.1364/OL.41.001241

Author Information

Name Institution
Sinan BalciUniversity of Turkish Aeronautical Association
Osman BalciBilkent University
Nurbek KakenovBilkent University
Fatih Bilge AtarBilkent University
Coskun KocabasBilkent University

Films

Plasma Al2O3

Hardware used: Unknown
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 100C

Film/Plasma Properties

Substrates

Ag

Notes

809