Publication Information

Title:
Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells
Type:
Conference Proceedings
Info:
2016 IEEE 43rd Photovoltaic Specialists Conference (PVSC)
Date:
2016-06-05

Author Information

Name Institution
K. C. ShinKorea Institute of Energy Research
J. I. LeeKorea Institute of Energy Research
Min Gu KangKorea Institute of Energy Research
Hee-eun SongKorea Institute of Energy Research

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Fixed Charge
Analysis: C-V, Capacitance-Voltage Measurements

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Substrates

Silicon

Keywords

Passivation

Notes

928