Publication Information

Title: Electrical and chemical characterization of Al2O3 passivation layer deposited by plasma-assisted atomic layer deposition in c-Si solar cells

Type: Conference Proceedings

Info: 2016 IEEE 43rd Photovoltaic Specialists Conference (PVSC)

Date: 2016-06-05

DOI: http://dx.doi.org/10.1109/PVSC.2016.7750196

Author Information

Name

Institution

Korea Institute of Energy Research

Korea Institute of Energy Research

Korea Institute of Energy Research

Korea Institute of Energy Research

Films

Plasma Al2O3 using Unknown

Deposition Temperature Range N/A

75-24-1

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Fixed Charge

C-V, Capacitance-Voltage Measurements

-

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

-

Substrates

Silicon

Keywords

Passivation

Notes

928



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