Publication Information

Title:
Effect of Deposition Method on Valence Band Offsets of SiO2 and Al2O3 on (Al0.14Ga0.86)2O3
Type:
Journal
Info:
ECS Journal of Solid State Science and Technology, 8 (7) Q3001-Q3006 (2019)
Date:
2018-11-24

Author Information

Name Institution
Chaker FaresUniversity of Florida
Fan RenUniversity of Florida
David HaysUniversity of Florida
Brent P. GilaUniversity of Florida
S. J. PeartonUniversity of Florida

Films

Plasma Al2O3



Film/Plasma Properties

Characteristic: Valence Band Offset
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Band Gap
Analysis: REELS, Reflection Electron Energy Loss Spectroscopy

Substrates

AlGaO

Keywords

Notes

Duplicate of 1220
1419