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Atomic Layer Deposition of Lithium-Nickel-Silicon Oxide Cathode Material for Thin-Film Lithium-Ion Batteries
Plasma-Enhanced Atomic Layer Deposition of Nickel Nanotubes with Low Resistivity and Coherent Magnetization Dynamics for 3D Spintronics
Reaction Mechanism of the Metal Precursor Pulse in Plasma-Enhanced Atomic Layer Deposition of Cobalt and the Role of Surface Facets
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Publication Information
Title:
Charge effects of ultrafine FET with nanodot type floating gate
Type:
Conference Proceedings
Info:
2016 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)
Date:
2016-07-06
Author Information
| Name | Institution |
|---|---|
| T. Ban | Ryukoku University |
| S. Migita | National Institute of Advanced Industrial Science and Technology |
| Yukiharu Uraoka | Nara Institute of Science and Technology |
| S. I. Yamamoto | Ryukoku University |
Films
Film/Plasma Properties
Substrates
Keywords
Notes
| 921 |
Popular Precursors
Top Authors
| Erwin (W.M.M.) Kessels |
| Hyeongtag Jeon |
| Hyungjun Kim |
| Mauritius C. M. (Richard) van de Sanden |
| Christophe Detavernier |