On the equilibrium concentration of boron-oxygen defects in crystalline silicon

Type:
Journal
Info:
Solar Energy Materials and Solar Cells, Volume 173, 2017, Pages 33 - 36
Date:
2017-06-19

Author Information

Name Institution
Dominic C. WalterInstitute for Solar Energy Research Hamelin (ISFH)
R. FalsterSunEdison Semiconductor
V. V. VoronkovSunEdison Semiconductor
J. SchmidtInstitute for Solar Energy Research Hamelin (ISFH)

Films

Plasma Al2O3


Film/Plasma Properties

Substrates

Silicon

Notes

1109