Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:

  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

Contact us for more information.



R. Falster Plasma Enhanced Atomic Layer Deposition Film Publications

Your search for plasma enhanced atomic layer deposition publications authored by R. Falster returned 1 record(s). If there are too many results, you may want to use the multi-factor search to narrow the results.

NumberTitle
1On the equilibrium concentration of boron-oxygen defects in crystalline silicon