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Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS2: large area, thickness control and tuneable morphology
Microstructure and Interfaces of Ultra-Thin Epitaxial AlN Films Grown by Plasma-Enhanced Atomic Layer Deposition at Relatively Low Temperatures
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Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films
Type:
Journal
Info:
PHYSICAL REVIEW B 90, 035208 (2014)
Date:
2014-07-01
Author Information
| Name | Institution |
|---|---|
| Wee Kiang Chong | Nanyang Technological University |
Films
Plasma Al2O3
Film/Plasma Properties
Substrates
Keywords
Notes
| 205 |