Introducing Plasma ALD, LLC's first in-house product.

An economical, compact inductively coupled plasma source.

Ideal for:
  • Plasma-Enhanced Atomic Layer Deposition
  • Thin Film Etch
  • Surface cleaning
  • Surface modification

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Direct measurement of coherent phonon dynamics in solution-processed stibnite thin films

Type:
Journal
Info:
PHYSICAL REVIEW B 90, 035208 (2014)
Date:
2014-07-01
DOI:
http://dx.doi.org/10.1103/PhysRevB.90.035208

Author Information

Name Institution
Wee Kiang ChongNanyang Technological University

Films

Plasma Al2O3

Hardware used: Picosun R200
TMA, Trimethylaluminum, Trimethylalumane, AlMe3, Al(CH3)3
CAS#: 75-24-1
Where to buy precursor
O2, Oxygen
CAS#: 7782-44-7
Deposition Temperature = 200C

Film/Plasma Properties

Substrates

Notes

205