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Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition
Type:
Journal
Info:
Japanese Journal of Applied Physics 58, 110902 (oct)
Date:
2019-09-24
Author Information
| Name | Institution |
|---|---|
| Masaki Hirayama | Tohoku University |
| Shigetoshi Sugawa | Tohoku University |
Films
Plasma Al2O3
Film/Plasma Properties
Characteristic: Electron Temperature, Te
Analysis: Langmuir Probe
Characteristic: Electron Density, ne
Analysis: Planar Probe
Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope
Characteristic: Interlayer
Analysis: TEM, Transmission Electron Microscope
Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy
Substrates
| Si(100) |
| SiO2 |
Notes
| 1549 |