Selective composition modification deposition utilizing ion bombardment-induced interfacial mixing during plasma-enhanced atomic layer deposition

Type:
Journal
Info:
Japanese Journal of Applied Physics 58, 110902 (oct)
Date:
2019-09-24

Author Information

Name Institution
Masaki HirayamaTohoku University
Shigetoshi SugawaTohoku University

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Electron Temperature, Te
Analysis: Langmuir Probe

Characteristic: Electron Density, ne
Analysis: Planar Probe

Characteristic: Conformality, Step Coverage
Analysis: TEM, Transmission Electron Microscope

Characteristic: Interlayer
Analysis: TEM, Transmission Electron Microscope

Characteristic: Chemical Composition, Impurities
Analysis: EDS, EDX, Energy Dispersive X-ray Spectroscopy

Substrates

Si(100)
SiO2

Keywords

Notes

1549