Publication Information

Title:
Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation
Type:
Conference Proceedings
Info:
2015 European Materials Research Society Spring Meeting
Date:
2015-05-13

Author Information

Name Institution
Matthieu PawlikUniversité Lille 1
F. MoriniUniversity of Tours
C. SionUniversité Lille 1
D. AureauUniversité de Versailles Saint-Quentin
Arnaud EtcheberryUniversité de Versailles Saint-Quentin
E. DuboisUniversité Lille 1
Jean-Pierre VilcotUniversité Lille 1

Films

Plasma Al2O3


Film/Plasma Properties

Characteristic: Chemical Composition, Impurities
Analysis: XPS, X-ray Photoelectron Spectroscopy

Characteristic: Chemical Composition, Impurities
Analysis: SIMS, Secondary Ion Mass Spectrometry

Characteristic: Unknown
Analysis: Kelvin Probe (SPV) Surface PhotoVoltage Measurements

Characteristic: Unknown
Analysis: C-V, Capacitance-Voltage Measurements

Substrates

Silicon

Keywords

Solar

Notes

440