Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO2/Al2O3 stack for silicon solar cells surface passivation

Publication Information

Title: Coupled used of SKP and C-V measurements to highlight the charge distribution and behavior in the Si/SiO₂/Al₂O₃ stack for silicon solar cells surface passivation

Type: Conference Proceedings

Info: 2015 European Materials Research Society Spring Meeting

Date: 2015-05-13

DOI: https://www.researchgate.net/publication/277272764_Coupled_used_of_SKP_and_C-V_measurements_to_highlight_the_charge_distribution_and_behavior_in_the_SiSiO2Al2O3_stack_for_silicon_solar_cells_surface_passivation

Author Information

Name

Institution

Université Lille 1

University of Tours

Université Lille 1

Université de Versailles Saint-Quentin

A. Etcheberry

Université de Versailles Saint-Quentin

E. Dubois

Université Lille 1

Jean-Pierre Vilcot

Université Lille 1

Films

Plasma Al₂O₃ using Unknown

Deposition Temperature Range N/A

TMA, AlMe₃, Trimethyl Aluminum

75-24-1

Where to buy precursor

O₂, Oxygen

7782-44-7

Film/Plasma Properties

Characteristic

Analysis

Diagnostic

Chemical Composition, Impurities

XPS, X-ray Photoelectron Spectroscopy

Chemical Composition, Impurities

SIMS, Secondary Ion Mass Spectrometry

Unknown

Kelvin Probe (SPV) Surface PhotoVoltage Measurements

Unknown

C-V, Capacitance-Voltage Measurements

Substrates

Silicon

Keywords

Solar

Notes

440

Mark Sowa

Shortcuts

Films

Precursors

Deposition Hardware

Film and Plasma Characteristics

Multi-factor Search

ALD and PEALD Background

On-line PEALD Theses

About plasma-ald.com

ALD Links

Publication Information

Author Information

Films

Plasma Al2O3 using Unknown

Deposition Temperature Range N/A

Film/Plasma Properties

Substrates

Keywords

Notes

Shortcuts

Plasma Al₂O₃ using Unknown